CAS · 999-97-3
Product Overview
Hexamethyldisilazane is a high-purity silicon-compounds supplied for industrial and specialty chemical applications. Contact our team for specifications, packaging options and lead times.
Product Specifications
| Appearance: | Colorless, transparent liquid |
|---|---|
| Purity: | 99% min |
| Hexamethyldisiloxane: | 0.5% max |
| Trimethylsilanol: | 0.2% max |
| Others: | 0.3% max |
| Chlorion (Cl⁻): | 15 ppm max |
Applications
1. Surface Treatment (Hydrophobic Coating)
Used to render glass, silica, and semiconductor surfaces hydrophobic.
Commonly applied in photolithography as a priming agent to improve photoresist adhesion on silicon wafers.
2. Silylation Reagent in Organic Synthesis
Converts active hydrogen-containing compounds (e.g., alcohols, amines, acids) into silyl ethers or amides, protecting functional groups during multi-step syntheses.
Widely used in gas chromatography (GC) sample preparation to make compounds more volatile and thermally stable.
3. Pharmaceutical & Fine Chemical Manufacturing
Acts as a protecting group reagent in the synthesis of active pharmaceutical ingredients (APIs).
Facilitates selective protection/deprotection strategies in complex molecule assembly.
4. Material Science and Electronics
Employed in semiconductor fabrication and microelectronic device production.
Used as a precursor or additive in producing organosilicon polymers and silicon-based coatings.
5. Catalyst and Intermediate
Can be used as a precursor for silicon-nitrogen compounds and other functional organosilicon derivatives.
Benefits
Effective Silylating Agent: Fast and efficient reaction with hydroxyl and amine groups.
Improves Adhesion: Enhances adhesion of photoresists and coatings to substrates.
Moisture Resistance: Produces hydrophobic surfaces, protecting against water ingress.
Volatile and Easy to Remove: Residual HMDS can be easily evaporated or decomposed.
Widely Compatible: Suitable for use in organic synthesis, microfabrication, and surface chemistry.
Conclusion
Hexamethyldisilazane (HMDS, CAS 999-97-3) is a key organosilicon reagent valued for its roles as a silylating agent, surface primer, and hydrophobic coating agent. It is indispensable in semiconductor processing, organic synthesis, and materials science due to its ability to modify surfaces and protect reactive groups. Its volatility and reactivity make it a powerful tool in both laboratory and industrial settings.
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